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Focused Ion Beam FEI (FIB - dual beam) (UA)

Electron microscopy

Description

The Helios NanoLab 650 is a versatile, high-performance DualBeam system containing a Ga+ focused ion beam (FIB) (500eV - 30keV) together with a FEG extreme high resolution (XHR) scanning electron microscope (SEM) and Si-drift EDX detector for element analyses. This allows selective etching of materials while imaging the process and the area of interest at the same time with sub-nanometer resolution. In addition the system is equipped with a Gas Injection System (GIS) containing a Pt source and an Omniprobe for micro-manipulation of the specimen. The main purpose of the Helios 650 is high quality site-specific TEM specimen preparation with in-situ liftout. Also slice-and-view experiments can be performed.

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TRANSNATIONAL ACCESS
WP1  Spectroscopy and rheology facilities
WP2  Scattering and diffraction facilities
WP3  Imaging facilities
WP4  Synthesis and up-scaling facilities
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